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Chemical Polishing & Chemical Mechanical Polishing

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CMP Orbis
Standing CMP System
Logitech ORBIS CMP시스템은 R&D 용으로 정교하게 설계되어있는 CMP 장비 입니다.
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  • Ideal for R&D environments and pilot process testing

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  • High capacity workspace for samples up to 2 of 200mm (8″)

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  • Downloadable data for analysis of process parameters

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  • Laboratory scale footprint

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  • Industry standard pad conditioning to maintain optimum pad life 
    • 번호 제목
    1 cmp_orbis_v0412.pdf

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