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Chemical Polishing & Chemical Mechanical Polishing

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Chemical Polishing System
Chemical Polishing System
Chemical Polishing System은 Chemical Polishing 을 하는 장비로서 Bromine Methanol, Peroxide Alkaline이나 Acid etches를 사용하여 샘플을 가공합니다.
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  • Minimal subsurface damage

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  • Wide range of wafer sizes can be polished, up to 200mm (8″)

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  • Robust, corrosion resistant construction

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  • Fine etch polishing of semiconductor wafers and electro-optic crystals

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  • Two versions available: CP3000 and CP4000 
    • 번호 제목
    1 chemical_polishing_2012_web.pdf

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