• 시편 전처리 장비
  • Product
  • Chemical Polishing & Chemical Mechanical Polishing

Chemical Polishing & Chemical Mechanical Polishing

Chemical Polishing System
Chemical Polishing System
Chemical Polishing System은 Chemical Polishing 을 하는 장비로서 Bromine Methanol, Peroxide Alkaline이나 Acid etches를 사용하여 샘플을 가공합니다.
  • Minimal subsurface damage
  •  

  • Wide range of wafer sizes can be polished, up to 200mm (8″)
  •  

  • Robust, corrosion resistant construction
  •  

  • Fine etch polishing of semiconductor wafers and electro-optic crystals
  •  

  • Two versions available: CP3000 and CP4000 
  • PARTNER